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UV-NIL Capillary Filling & Bubble Defects (2D)

2D cross-section and phase-map simulator for UV nanoimprint lithography: watch resist climb a row of trench cavities by capillary action, compare the simulated front against the analytic Washburn rise curve, and read a live capillary-number defect map swept over descent speed and viscosity.

Nanotechnology & MEMS2DModerate60 FPS📱 Mobile-adapted⇄ 3D version

This 2D rebuild slices a single UV nanoimprint lithography step into three linked panels instead of one isometric scene: a side-view row of trench cavities filling by capillary action, a live rise-vs-time chart that overlays the simulated meniscus on the analytic Washburn law, and a capillary-number phase map swept across descent speed and viscosity. The same capillary number Ca = ηv/γ decides whether trenches fill cleanly or seal air pockets mid-fill; the phase map lets you see the defect boundary before you even press start, and the rise chart shows exactly how a contact-angle change reshapes the Washburn curve.

⚙ Under the hood

A 2D cross-section rebuild of the UV-nanoimprint capillary-fill simulator: watch a side-view row of trench cavities fill by capillary action, compare the live meniscus front against the analytic Washburn rise curve, and read a capillary-number defect-probability map swept over mold descent speed and resist viscosity.

nanoimprint lithographycapillary flowUV-NILdefect formationnanofabricationWashburn equationphase map

2D · HTML5 Canvas 2D · 60 FPS target · runs fully client-side, no install