Home▸Nanotechnology & MEMS▸E-Beam Lithography 2D: Proximity Effect & Dose Correction

E-Beam Lithography: Proximity Effect & Dose Correction (2D)

Interactive 2D electron-beam lithography simulator: a real double-Gaussian forward/backscatter dose model writes a nanopillar array, a live dose-profile plot shows proximity-effect bridging appear at tight pitch, and per-site dose correction pulls it back into spec.

Nanotechnology & MEMS2DAdvanced60 FPS📱 Mobile-adapted⇄ 3D version

Fabricating the tight nanoparticle gaps behind plasmonic hot-spot sensors starts with electron-beam lithography, and the single biggest obstacle is the proximity effect: forward- and back-scattered electrons spread each write point's dose into a halo that overlaps its neighbours. This simulator computes a real double-Gaussian point-spread dose model over a nanopillar write pattern, plots it top-down alongside a live dose cross-section, lets you tune the beam/resist/substrate scattering parameters and the pattern pitch, and shows exactly when neighbouring dots bridge into a single cleared trench — plus how density-based dose correction pulls the pattern back into spec.

⚙ Under the hood

Write a nanopillar array with a real double-Gaussian forward/backscatter electron dose model, watch neighbouring dots bridge together on a live top-down field and dose-profile plot as pitch tightens, and correct it with density-based dose scaling.

nanofabricationelectron-beam-lithographyproximity-effectplasmonicsdose-correctionresist

2D · HTML5 Canvas 2D · 60 FPS target · runs fully client-side, no install