Focused Electron Beam Induced Deposition: 3D Nanowire Growth

Focused electron/ion beam induced deposition (FEBID/FIBID) grows solid nanostructures directly in 3D space by dissociating a gas-phase precursor adsorbed on whatever surface the beam last wrote — no resist, no mask, no flat-substrate constraint. This 2D companion simulator makes the precursor field spatial: a real diffusing coverage grid instead of one shared number, so you can see precursor deplete right under the beam and slowly recover through diffusion from its still-saturated neighbours. Steer the beam by hand, or run the built-in fast-scan-vs-slow-dwell comparison to see, from the actual simulated deposit totals, why real FEBID writers favour many quick low-dose passes over one long, depleting dwell.