HomeNanotechnology & MEMSAtomic Layer Deposition: One Atomic Layer at a Time

Atomic Layer Deposition Simulator

Interactive 3D atomic layer deposition simulator: pulse precursor A gas until it self-limits at full surface saturation, purge, pulse precursor B to complete one atomic layer, and purge again — watch a deep, high-aspect-ratio trench fill in with perfectly conformal coverage, then switch to line-of-sight PVD sputtering to see the same trench coat unevenly and starve at the bottom.

Nanotechnology & MEMS3DModerate60 FPS
atomic-layer-deposition-one-atomic-layer-at-a-time ↗ Open standalone

Watch a deep, high-aspect-ratio trench get coated one atomic layer at a time. Precursor A gas pulses in and chemisorbs onto every open surface site — self-limiting once the surface saturates — then purges, then precursor B pulses in and reacts only with the A-covered layer to complete one atomic layer, then purges again. Toggle to physical vapor deposition to see the same trench coated unevenly by line-of-sight sputtering, thick on top and starved at the bottom.

⚙ Under the hood

Interactive 3D atomic layer deposition simulator: pulse precursor A gas until it self-limits at full surface saturation, purge, pulse precursor B to complete one atomic layer, then purge again — watch a deep, high-aspect-ratio trench fill in with near-perfect conformal coverage cycle after cycle. Toggle to line-of-sight PVD sputtering on the same trench to see the top thicken quickly while the bottom stays almost bare, with a live conformality readout comparing the two.

atomic layer depositionALDsemiconductor manufacturingthin filmself-limiting reactionchemisorptionconformal coatingPVDsputteringhigh aspect rationanofabricationchip manufacturing

3D · Three.js / WebGL renderer · 60 FPS target · runs fully client-side, no install

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