Focused Ion Beam Milling Simulator

A focused ion beam (FIB) system fires a finely focused stream of gallium ions at a solid surface and mills away material atom by atom through physical sputtering — no mask, no chemistry, no resist, unlike optical or electron-beam lithography. This simulator rasters a Ga⁺ beam across a silicon block using a real Sigmund/Yamamura-style angular sputter-yield model: tilt the incidence angle and watch the yield rise as the collision cascade moves closer to the surface, peak around 60–70°, then collapse again near grazing incidence as ions reflect instead of embedding. Pick a mill pattern — an open-area box, a line trench, an alignment cross, or a circular via — set the beam dose, and watch the block mill away in real time with live sputter-yield, mill-rate and depth readouts, exactly the mechanism used to prepare TEM lamellae and edit circuits in real fabs.