Nanowire Batch Yield & Uniformity Simulator (2D)

Growing one nanowire is physics; growing a wafer full of them is manufacturing. This 2D simulator takes the same Gibbs-Thomson-corrected VLS growth law used by the 3D nanomanufacturing model and applies it to an entire batch of 400 catalyst droplets at once, drawn from a log-normal diameter distribution with a mean and dispersion you control. Instead of watching a single wire's length or growth-rate curve, you watch a population statistic emerge: what fraction of the batch clears the critical diameter and actually grows (yield), and how tightly clustered the surviving nanowire lengths stay as synthesis proceeds (uniformity). Tune supersaturation, temperature, mean catalyst size and size dispersion, start the batch, and watch the population histogram and the live length-distribution histogram answer the question every real nanowire-array fab has to answer: not "does it grow," but "how much of it grows, and how alike."