ALD Nanocoating Growth: Saturation Curve & ALD Window

This is the 2D counterpart to the 3D atomic layer deposition scene, computing the identical self-limiting ABAB pulse/purge chemistry through four analytic plots instead of a rendered nanoscale grid: a live cross-section of the growing film, the Langmuir dose-saturation curve that makes ALD self-limiting, a growth-per-cycle-vs-temperature ALD window showing where the process falls into slow, ideal or CVD-like runaway growth, and a thickness-vs-cycle trace for the current run. Tune the precursor dose, substrate temperature, surface reactivity, pulse/purge timing and material system (Al₂O₃, TiO₂ or HfO₂) and watch every readout react to the same formulas driving the plots.