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EUV Lithography Simulator

Interactive EUV lithography simulator: a laser-struck tin droplet flashes 13.5nm extreme-ultraviolet light, bounced through a chain of mirrors onto a reflective mask and projected onto a resist-coated wafer. Compare EUV against older 193nm DUV optics and tune numerical aperture and the k1 process factor against the real resolution formula.

Nanotechnology & MEMS3DAdvanced60 FPS💧 Water

Details

CategoryNanotechnology & MEMS

RenderingThree.js · WebGL

DifficultyAdvanced

Target FPS60

ControlsLight source buttons (EUV 13.5nm / DUV 193nm) switch the exposure wavelength; New cycle button restarts the droplet-laser-plasma-projection animation; numerical aperture (NA) slider and process factor (k1) slider feed the live resolution = k1*lambda/NA formula and redraw the wafer's exposed pattern accordingly.

Three.jsEUV lithographysemiconductor manufacturingphotolithographyInstancedMesh

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This simulator walks through a full extreme-ultraviolet lithography cycle: a laser pulse strikes a falling tin droplet, flashing 13.5nm light that bounces through a chain of mirrors, reflects off a patterned mask, and projects the chip layout onto a resist-coated wafer below. Switch to 193nm DUV light to see the same mask pattern lose fidelity as it prints, and tune the numerical aperture and k1 process factor against the real resolution formula, resolution = k1·λ/NA, that governs how small a transistor a fab can actually print.

⚙ Under the hood

Interactive EUV lithography simulator: a laser pulse strikes a tin droplet to flash 13.5nm extreme-ultraviolet light, bounced through a mirror chain onto a reflective mask and projected onto a resist-coated wafer. Switch to 193nm DUV light and tune numerical aperture and k1 to see the real resolution formula shrink or blur the printed pattern.

Three.jsEUV lithographysemiconductor manufacturingphotolithographyInstancedMesh

3D · Three.js / WebGL renderer · 60 FPS target · runs fully client-side, no install