Real chip fabs (and superconducting-qubit foundries building the same way) predict die yield with a Poisson critical-area model. Point defects — dust, lithography voids, resist tears — land at random positions across the wafer at an average density D₀ (defects per cm²). A die only fails if a defect lands inside its critical area Acrit — the small fraction of the die (Josephson junctions, wiring pinch-points) actually sensitive to a defect:
A_crit = N_qubits · a_q (a_q ≈ 0.0015 cm² per qubit)
λ = D₀ · A_crit (expected defects on one die's critical zone)
P(die survives) = P(0 defects) = e^(−λ) ← Poisson probability of zero hits
This top-down map scatters an actual Poisson-distributed set of defect points over the wafer (not just the formula) and tests each die's critical zone individually, so the measured yield you see is a real random sample — it converges to the theoretical e^(−λ) curve but jitters around it, exactly like a real wafer run. The convergence chart below the wafer plots that theoretical curve against every wafer you've sampled at its own density, so you can watch the scatter tighten around the curve as you resample.
- Defect density D₀ — process maturity. A mature fab runs low D₀; a new process runs high D₀.
- Die size — bigger dies pack fewer chips per wafer but change how the fixed-radius wafer edge is used.
- Qubits per die — more qubits per chip means more critical area, so λ grows and yield falls — the core scaling tension quantum-hardware roadmaps face: bigger chips ship more qubits per good die, but fewer dies survive.
- New Wafer — resamples the defect map for the current settings, showing run-to-run variance around the theoretical curve.
- Drag / scroll the wafer map — pan and zoom to inspect individual dies and defects up close.
Real-world relevance: this is the same yield-vs-defect-density trade-off superconducting-qubit companies (IBM, Google, Rigetti) publish in their scaling roadmaps — it is one of the concrete engineering bottlenecks behind "more qubits" being harder than it sounds.