VAPORIUM Θ–6 | MySimulator Research Instruments

01 / CONTROL ROOM

Experiment setup

LIVE

A. EXPERIMENT PROTOCOL

Select a procedure

B. DEPOSITION PARAMETERS

Substrate rotation7.5 RPM

STATIC30 RPM

Source emission rate2.0 nm/s

08 NM/S

Source lateral offset−34 mm

−70 MM+70 MM

Residual gas pressure0.003 Pa

10⁻⁴ PA10⁻¹ PA

Emission cosine exponentn = 1.5

ISOTROPICFOCUSED

C. MASK GEOMETRY

Shadow-mask pattern

Aperture dimension48 mm

10 MM85 MM

Source shutterBlock all deposition flux

Educational point-source evaporation model. Collision losses and geometric masking are approximated; not calibrated process control.

02 / PROCESS VIEW

◉ ORBIT CAM 3D / WEBGL2

SIMULATION ACTIVE

VACUUM CHAMBER / SECTION V01

X Y Z

01 EVAPORATION SOURCETHERMAL CRUCIBLE

02 ROTATING SUBSTRATEFILM ACCUMULATION

DRAG TO ORBIT · SCROLL TO ZOOM

100 mm reference