Nanoimprint Lithography Simulator

Imprint cycle

Process

Heat resist above Tg

Press mold into resist

Cool below Tg (holding)

Demold (separate)

Parameters

Imprint pressure 40 bar

Resist temperature --

Mold feature pitch 8 nm

Status

Resist state

Solid (below Tg)

Mold gap

120 nm

Pattern fidelity

Achievable res.

<10 nm

Why NIL differs from photolithography: resolution here is set purely by how precisely the mold was fabricated — the polymer is mechanically stamped, not chemically exposed. Optical lithography is capped by the diffraction limit of its light source; imprinting isn't, because it copies a physical relief instead of projecting a wavefront.

Idle — press Start imprint cycle