LIVE 3D VIEWPORT

Vacuum deposition chamber

SHUTTER CLOSED

SPUTTER SOURCE target

AT-CUT QUARTZ 5 MHz

FILM GROWTH 0.00 nm

↔ DRAG TO ORBIT / SCROLL TO ZOOMWEBGL2 · PROCEDURAL GEOMETRY

RESONANCE SHIFT

+0.00 Hz

relative to nominal · incl. thermal

FILM THICKNESS

0.00 nm

uniform rigid film assumption

LOADED MASS

0.00 ng

active electrode area

QUALITY FACTOR

—

damping & gas loss proxy

LIVE TELEMETRY / 01

Frequency shift over time

Δf (Hz)

TRANSDUCER OUTPUT0.0 s elapsed

TRANSFER FUNCTION / 02

Resonance response

|H(f)|

CLICK GRAPH TO SET DETUNING±140 Hz

04 SENSOR TELEMETRY

TRACKED RESONANCE5,000,000.00Hz · fundamental mode

RF excitation5,000,000 Hz

Response amplitude1.000

Phase lag−90.0°

3 dB bandwidth58.9 Hz

Ringdown τ5.4 ms

Quartz thickness0.334 mm

Mass sensitivity56.6 Hz/(µg/cm²)

Mass-only shift0.00 Hz

Thermal contribution0.00 Hz

Deposition stateIDLE

05 OPERATING PRINCIPLE

SAUERBREY EQUATION RIGID FILM

Δf = − 2 f₀²√(ρ_q μ_q) · ΔmA

Deposited mass increases the crystal’s effective acoustic inertia, lowering its resonant frequency.

MODEL SCOPE Rigid, uniform films in low-pressure gas only. Thermal and damping effects are illustrative estimates. Not a calibrated laboratory instrument.

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