Plasma Chemistry Reactor | mysimulator.uk

Discharge

Applied voltage / power 1000 V

Gas composition

Plasma state

State

Off

Electron temp Tₑ

–

Gas temp T_gas

–

Electron density

–

Etch depth

–

Legend

Electron (e⁻) Ion (+) Radical (O• / F•) Ar neutral O₂ neutral CF₄ neutral

Voltage sets electron energy (Tₑ, in eV). Gas temperature stays near room temperature — that gap is what makes this a non-equilibrium / "cold" plasma. Radicals and ions drift down and etch the sample wafer.

Sample wafer e⁻ path

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